Etchants for chromium thin films for microelectronics applications offer excellent compatibility with positive and negative photoresists. Chromium Etchants provide fine-line control with minimal undercutting. High purity formulations filtered to 0.2 micron are ideal for critical devices.

CHROMIUM ETCHANT 1020
Fast etch rate with minimal undercutting

CHROMIUM ETCHANT 1020AC
Slower etch rate to eliminate undercutting and for broader compatibility

CHROMIUM MASK ETCHANT CE-5M
Ideal for high precision photomask etching.

CHROMIUM CERMET ETCHANT TFE
For chromium-silicon films. Compatible with copper, nickel, and gold.

FEATURES:

  • High purity
  • 0.2 micron filtration
  • Excellent photoresist compatibility
  • Uniform etch rates and patterns.

Chromium Etchants
1020 and 1020AC

DESCRIPTION:

Transene Chromium Etchants 1020 and 1020AC are high purity ceric ammonium nitrate systems for precise, clean etching of chromium and chromium oxide films. Chromium Etchant 1020AC is nitric-acid free and exhibits a slower etch rate. Both etchants are compatible with positive and negative photoresists. Chromium Etchant 1020 is filtered to remove all particulates above 0.2 microns. Minimal undercutting is achieved with Chromium Etchant 1020AC.

PROPERTIES OF TRANSENE CHROMIUM CERMET ETCHANT 1020

How do I increase the etch rate? 1. The rate will approximately double with every 10°C increase in temperature.
2. Increase the rate of stirring or agitation.
How do I reduce the etch rate? Adding 1 part deionized water to 2 parts etchant will reduce the etch rate approximately 50%.
Do I need to dilute the etchant? No, it is ready to use.
How do I reduce undercutting? Increase the rate of stirring or agitation.
Appearance Clear orange
pH Acidic
Etch Rate at 40°C 40 Å/sec.
Etch Capacity (rate declines at ~70%) 65 g/gallon
Shelf Life 1 year
Storage Conditions Ambient
Filtration 0.2 um
Recommended Operating Temperatures 20-80oC (30-40oC most common)
Rinse Deionized water
Photoresist Recommendations PKP Type II or HARE SQ (SU-8 type)
Select Compatible Materials Au, Ti, oxide, nitride, Si

See http://transene.com/etch-compatibility/ for more details.

Select Incompatible Materials Al, Ni, Cu, NiCr
Compatible Plastics HDPE, PP, Teflon, PFA, PVC
Country of Origin USA
Availability 1-2 days
Available Sizes Quart, Gallon, 5 Gallon, 55 Gallon
Packaging HDPE
Packing 4 gallons/case
Isotropy Isotropic
Incompatible Chemicals Strong bases
Additional Information

PROPERTIES OF TRANSENE CHROMIUM CERMET ETCHANT 1020AC

How do I increase the etch rate? 1. The rate will approximately double with every 10°C increase in temperature.
2. Increase the rate of stirring or agitation.
How do I reduce the etch rate? Adding 1 part deionized water to 2 parts etchant will reduce the etch rate approximately 50%.
Do I need to dilute the etchant? No, it is ready to use.
How do I reduce undercutting? Increase the rate of stirring or agitation.
Appearance Clear orange
pH Acidic
Etch Rate at 40°C 32 Å/sec.
Etch Capacity (rate declines at ~70%) 65 g/gallon
Shelf Life 3 months
Storage Conditions Ambient
Filtration 0.2 um
Recommended Operating Temperatures 20-80oC (30-40oC most common)
Rinse Deionized water
Photoresist Recommendations KLT6000 Series, KLT 5300 Series, HARE SQ (SU-8 type), TRANSIST, or PKP Type II
Select Compatible Materials Au, Ti, oxide, nitride, Si

See http://transene.com/etch-compatibility/ for more details.

Select Incompatible Materials Al, Ni, Cu, NiCr
Compatible Plastics HDPE, PP, Teflon, PFA, PVC
Country of Origin USA
Availability 1-2 days
Available Sizes Quart, Gallon, 5 Gallon, 55 Gallon
Packaging HDPE
Packing 4 gallons/case
Isotropy Isotropic
Incompatible Chemicals Strong bases
Additional Information

APPLICATION:

Etching temperature varies depending on film thickness. Etch times range from 15 seconds to 60 seconds at room temperature. Chromium Etchants should be operated in a well ventilated hood.

Chromium Cermet Etchant TFE

DESCRIPTION:

Chromium Cermet Etchant TFE is a selective chromium etchant for microelectronics applications. Chromium Cermet Etchant TFE effectively etches chromium films deposited on copper, nickel, or gold. This potassium hexacyanoferrate formulation is compatible with only negative photoresist. In addition, TFE is an excellent choice for etching chromium oxide, Cr-Si, and Cr-Si-O deposits.

PROPERTIES OF TRANSENE CHROMIUM CERMET ETCHANT TFE

How do I increase the etch rate? 1. The rate will approximately double with every 10°C increase in temperature.
2. Increase the rate of stirring or agitation.
How do I reduce the etch rate? Adding 1 part deionized water to 2 parts etchant will reduce the etch rate approximately 50%.
Do I need to dilute the etchant? No, it is ready to use.
How do I reduce undercutting? Increase the rate of stirring or agitation.
Appearance Brown
pH Alkaline
Etch Rate at 50°C 15-20 Å/sec.
Etch Capacity (rate declines at ~70%) 65 g/gallon
Shelf Life 1 year
Storage Conditions Ambient
Filtration 1 um
Recommended Operating Temperatures 20-80oC (30-40oC most common)
Rinse Deionized water
Photoresist Recommendations PKP Type II or HARE SQ (SU-8 type)
Select Compatible Materials Au, Ni, Cu, alumina

See http://transene.com/etch-compatibility/ for more details.

Select Incompatible Materials Al, Si, Si-O
Compatible Plastics HDPE, PP, Teflon, PFA, PVC
Country of Origin USA
Availability 1-2 days
Available Sizes Quart, Gallon, 5 Gallon, 55 Gallon
Packaging HDPE
Packing 4 gallons/case
Isotropy Isotropic
Incompatible Chemicals Strong acids
Additional Information

APPLICATION:

Chromium Cermet Etchant TFE is a ready-to-use solution specifically designed to remove films of Cr, Cr-O, Cr-Si, and Cr-Si-O from metal substrates such as copper, gold, and nickel. Heating the etchant to 40-60 oC will speed the etch rate for thicker films. Continuous stirring is recommended during etching.


Chromium Etchants
For Use in Thin Film Microelectronics.

These etchants are designed for minimal undercutting and good process control. They are compatible with negative and positive photoresists.

Chromium – Types 8001-N and 8002-A
For slower etch rate
8001-N: Nitric acid based
8002-A: Acetic acid based

Chromium Cermet Etch – Type TFE
Standard Cr-Si and Cr-SiO Cermets
Etch Rate: 1000 Å/min (for 20 atomic % SiO)

CHROMIUM MASK ETCHANT CE-5M

DESCRIPTION:

Chrome Mask Etchant CE-5M is a ceric ammonium nitrate /perchloric acid etching solution for all types of chrome plates. Etch rate will depend upon substrate chrome density and process conditions. In general, the etch time usually ranges from 15 to 55 seconds at room temperature (25 oC). The etchant can be supplied with an added surfactant (CE-5MS).  Chrome Mask Etchant CE-5M is suitable for sub-micron photolithography applications.

Storage and Handling:

Store at room temperature away from direct sunlight, keep container sealed when not in use.  This is an acid oxidizing solution and should be handled with caution. In case contact is made to eyes or skin, flush with large quantities of water and contact a physician if irritation persists.

PROPERTIES OF TRANSENE CHROMIUM MASK ETCHANT CE-5M

How do I increase the etch rate? 1. The rate will approximately double with every 10°C increase in temperature.
2. Increase the rate of stirring or agitation.
How do I reduce the etch rate? Adding 1 part deionized water to 2 parts etchant will reduce the etch rate approximately 50%.
Do I need to dilute the etchant? No, it is ready to use.
How do I reduce undercutting? Increase the rate of stirring or agitation.
Appearance Clear, orange
pH Acidic
Etch Rate at 20°C 50 Å/sec.
Etch Capacity (rate declines at ~70%) 65 g/gallon
Shelf Life 1 year
Storage Conditions Ambient
Filtration 0.2 um
Recommended Operating Temperatures 20-80oC (30-40oC most common)
Rinse Deionized water
Photoresist Recommendations KLT6000 Series, KLT 5300 Series, HARE SQ (SU-8 type), TRANSIST, or PKP II
Select Compatible Materials Au, oxide, nitride, Ti

See http://transene.com/etch-compatibility/ for more details.

Select Incompatible Materials Ni, Cu, Ru, Al, NiCr
Compatible Plastics HDPE, PP, Teflon, PFA, PVC
Country of Origin USA
Availability Stock item
Available Sizes Quart, Gallon, 5 Gallon, 55 Gallon
Packaging HDPE
Packing 4 gallons/case
Isotropy Isotropic
Incompatible Chemicals Flammables, combustibles, strong bases
Additional Information Oxidizer

CHROMIUM ETCHANT CRE-473

Chromium Etchant CRE-473 is a selective chromium etchant for plated hard chromium in microelectronics applications. CRE-473 effectively etches plated chromium films deposited on copper, nickel, gold, or molybdenum. Good compatibility with positive and negative photoresists is obtained.  CRE-473 is not an effective etchant for sputtered, evaporated, or bulk chromium.

APPLICATION:

Chromium Etchant CRE-473 is a ready-to-use solution specifically designed to remove electroplated chromium films from metal substrates such as copper, gold, nickel, and molybdenum. Heating the etchant to 40 oC will speed the etch rate for thicker films.

PROPERTIES OF TRANSENE CHROMIUM ETCHANT CRE-473

How do I increase the etch rate? 1. The rate will approximately double with every 10°C increase in temperature.
2. Increase the rate of stirring or agitation.
How do I reduce the etch rate? Adding 1 part deionized water to 2 parts etchant will reduce the etch rate approximately 50%.
Do I need to dilute the etchant? No, it is ready to use.
How do I reduce undercutting? Increase the rate of stirring or agitation.
Appearance Water-white to light yellow
pH < 1
Etch Rate at 20°C 14 Å/sec.
Etch Capacity (rate declines at ~70%) 65 g/gallon
Shelf Life 1 year
Storage Conditions Ambient
Filtration 1 um
Recommended Operating Temperatures 20-80oC (30-40oC most common)
Rinse Deionized water
Photoresist Recommendations KLT6000 Series, KLT 5300 Series, HARE SQ (SU-8 type), TRANSIST, or PKP II
Select Compatible Materials Au, oxide, nitride

See http://transene.com/etch-compatibility/ for more details.

Select Incompatible Materials Ni, Cu, Al, Ti
Compatible Plastics HDPE, PP, Teflon, PFA, PVC
Country of Origin USA
Availability 1-2 days
Available Sizes Quart, Gallon, 5 Gallon, 55 Gallon
Packaging HDPE
Packing 4 gallons/case
Isotropy Isotropic
Incompatible Chemicals Strong bases
Additional Information