Electronic Grade Chemicals

High purity chemicals, low sodium, required for high yield processing of semiconductors.

Ammonium Fluoride 40%

Assay (NH4F) 40.0% ± 1%
pH 7.75 ± 0.25
Residue after ignition(max) 10 PPM

 

Impurity Max. PPM
Chlorides (Cl) 4.0
Sulfates (as SO4) 2.0
Heavy Metals (as Pb) 1.0
Iron (Fe) 1.0
Phosphorus (as PO4) 1.0
Sodium (Na) 1.0
Arsenic (As) 0.5
Copper (Cu) 0.5
Nickel (Ni) 0.5

Hydrofluoric Acid 49%

Assay (HF) 49% ± 0.25%
Sp. GR. @ 60 °F 1.18 ± 0.005
Residue after ignition(max) 5 PPM
Fluosilicic Acid (H2SiF6) 100 PPM
Impurity Max. PPM
Chlorides (Cl) 5.0
Sulfates (as SO4) 2.0
Phosphorus (as PO4) 1.0
Heavy Metals (as Pb) 0.5
Iron (Fe) 0.5
Sodium (Na) 0.5
Copper (Cu) 0.1
Lead (Pb) 0.1
Nickel (Ni) 0.1
Arsenic (As) 0.05

Nitric Acid 70%

Assay ( HNO3) 70% ± 1%
Sp. Gr. @ 60 °F 1.420 ± 0.004
Residue after ignition(max) 4 PPM
Impurity Max. PPM
Chlorides (Cl) 0.1
Sulfates (as SO4) 1.0
Heavy Metals (as Pb) 0.1
Arsenic (As) 0.005
Iron (Fe) 0.2
Copper (Cu) 0.05
Nickel (Ni) 0.05
Chromium (Cr) 0.1

Acetic Acid Glacial

Assay (CH3COOH) 99.7% minimum
Residue after evaporation(max) 10 PPM
Impurity Max. PPM
Chlorides (Cl) 1.0
Sulfates (as SO4) 1.0
Heavy Metals (as Pb) 0.5
Iron (Fe) 0.2
Copper (Cu) 0.1
Nickel (Ni) 0.1