Semiconductor and Thin Film Etchants for Microelectronic Circuits
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| THIN FILM | TRANSENE ETCHANTS | APPLICATION | ||
|---|---|---|---|---|
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ALUMINUM ETCHANTS
TYPE A TYPE D TYPE F |
@25 °C @ 40 °C
30 Å/sec 80 Å/sec 40 Å/sec 125 Å/sec 30 Å/sec 80 Å/sec |
KLT6000 Series KLT 5300 Series HARE SQ (SU-8) PKP-308PI TRANSIST |
Semiconductor & Integrated Circuits GaAs & GaP Devices AlSi Materials |
| Al2O3 | TRANSETCH N TANTALUM ETCHANT 111 |
120 Å/min@180 °C 20-30 Å/sec@20 °C |
SiO2 PKP-308PI HARE SQ (SU-8) |
Semiconductor Devices Sapphire |
| BOE | BUFFERED OXIDE ETCHANT | Variable | PKP-308PI HARE SQ (SU-8) |
Semiconductor & Integrated Circuits |
| Cr | CHROMIUM ETCHANTS
1020 1020AC |
@ 40 °C
40 Å/sec 32 Å/sec |
KLT6000 Series KLT 5300 Series HARE SQ (SU-8) PKP-308PI TRANSIST |
Thin Film Circuits Chrome Mask |
| Cr-Si
Cr-SiO |
CHROMIUM ETCHANT TFE | 1000 Å/min @ 50 °C | PKP-308PI HARE SQ (SU-8) |
Thin Film Circuits |
| Cu | COPPER ETCHANTS
CE-100 CE-200 APS-100 Copper Etch 49-1 Copper Etch BTP |
1 mil/min @ 40 °C 0.5 mil/min @ 40 °C 80 Å/sec @ 40 °C 22 Å/sec @ 30 °C 150 Å/sec @ 30 °C |
KLT6000 Series KLT 5300 Series HARE SQ (SU-8) PKP-308PI TRANSIST |
P.C.Boards Thin Film Circuits Ni Compatability Ni Compatability |
| GaAs | GALLIUM ARSENIDE
GA ETCH 100 GA ETCH 200 GA ETCH 300 |
100 Å/sec @ 40 °C 20 Å/sec @ 5 °C 22 Å/sec @ 25 °C Defect Delineation |
KLT6000 Series KLT 5300 Series HARE SQ (SU-8) PKP-308PI |
Microelectronic Circuits Semiconductor Testing |
| GaN | GALLIUM NITRIDE | 80 A/min | KLT6000 Series KLT 5300 Series HARE SQ (SU-8) PKP-308PI |
LED |
| Ga2O3 | GALLIUM OXIDE | 10 Å/sec @ 25 °C | PKP-308PI HARE SQ (SU-8) |
Microelectronic Circuits |
| GaP | GALLIUM PHOSPHIDE | A Face(Ga):
115 micron/hr @ 80 °C B Face (P): 210 micron/hr @ 80 °C |
KLT6000 Series KLT 5300 Series HARE SQ (SU-8) PKP-308PI |
Light Emitting Diodes |
| Ge | GERMANIUM | 250 Å/sec @ 20 °C | KLT6000 Series KLT 5300 Series HARE SQ (SU-8) PKP-308PI |
Semiconductor Devices |
| Au | GOLD ETCHANTS
TFA TFAC GE-8148 GE-8110 GE-8111 |
28 Å/sec @ 25 °C 30 Å/sec @ 60 °C 50 Å/sec @ 25 °C 15 Å/sec @ 25 °C 15 Å/sec @ 25 °C |
KLT6000 Series |
Thin Film Circuits GaAs compatible Ni compatible Ni compatible Ni compatible |
| Hf, HfO | HAFNIUM, HAFNIUM OXIDE | 45 Å/sec @ 25 °C
ALD HfO 7.5 Å/sec |
KLT6000 Series KLT 5300 Series HARE SQ (SU-8) PKP-308PI |
Use Titanium Etch TFT |
| In2O3 ITO |
INDIUM OXIDE INDIUM TIN OXIDE |
15 Å/sec @ 25 °C | KLT6000 Series KLT 5300 Series HARE SQ (SU-8) PKP-308PI TRANSIST |
Microelectronic Circuits |
| InP | INDIUM PHOSPHIDE | 30 mins @ 25 °C | PKP-308PI HARE SQ (SU-8) |
Microelectronic Circuits |
| Fe2O3 | IRON OXIDE MASK ETCHANT ME-10 ME-30 |
50 Å/sec @ 25 °C 25 Å/sec @ 25 °C |
KLT6000 Series KLT 5300 Series HARE SQ (SU-8) PKP-308PI |
Microelectronic Circuits |
| Polyimide | KAPTON POLYIMIDE ETCHANT |
0.013 mil/min @ 40 °C
0.07 mil/min @ 60 °C |
PKP-308PI HARE SQ (SU-8) |
Polyimide/Copper Clad Laminates |
| MgO | Magnesium Oxide Etchant MgOX12 | 40 Å/sec @ 30°C | KLT6000 Series KLT 5300 Series HARE SQ (SU-8) PKP-308PI TRANSIST |
|
| Mo | MOLY ETCHANT TFM | 55 Å/sec @ 30 °C
85 Å/sec @ 60 °C |
PKP-308PI HARE SQ (SU-8) TRANSIST |
Microelectronic Circuits |
| Nb
NbN NbO |
Niobium
Niobium Nitride Niobium Oxide |
50Å / sec @ 25 oC | KLT6000 Series KLT 5300 Series HARE SQ (SU-8) PKP-308PI |
Microelectronics |
| Ni-Cr | NICHROME ETCHANTS
TFN |
50 Å/sec @ 40 °C |
KLT6000 Series KLT 5300 Series HARE SQ (SU-8) PKP-308PI TRANSIST |
Thin Film Circuits |
| Ni | NICKEL ETCHANTS
TFB TFG Type I |
30 Å/sec @ 25 °C 50 Å/sec @ 40 °C 3 mil/hr @ 40 °C |
KLT6000 Series KLT 5300 Series HARE SQ (SU-8) PKP-308PI TRANSIST |
Thin Film Circuits |
| Ni-V | Nickel-Vanadium Etch | 30 Å/sec @ 20 °C | KLT6000 Series KLT 5300 Series HARE SQ (SU-8) PKP-308PI TRANSIST |
Microelectronics |
| Pd | PALLADIUM ETCHANTS
TFP |
110 Å/sec @ 50 °C | KLT6000 Series KLT 5300 Series HARE SQ (SU-8) PKP-308PI TRANSIST |
Semiconductor & Thin Film Circuits |
| Pd | PALLADIUM ETCHANT
EC |
KLT6000 Series KLT 5300 Series HARE SQ (SU-8) PKP-308PI TRANSIST |
Electrochemical Etching | |
| REAGENT SEMICONDUCTOR ETCHANTS (RSE) | PKP-308PI HARE SQ (SU-8) |
|||
| Ru | RUTHENIUM ETCH | 20 Å/sec @ 20 °C | KLT6000 Series KLT 5300 Series HARE SQ (SU-8) PKP-308PI TRANSIST |
Microelectronics |
| SEMICONDUCTOR DEFECT DELINEATION ETCHANTS | ||||
| Si | REAGENT SEMICONDUCTOR ETCHANTS (RSE)
SILICON SLOW ETCH SILICON MESA ETCH PREFERENTIAL SILICON ETCHANTS PSE 300 SOLAR CELL ETCHANTS SCE-300 WRIGHT-JENKINS ETCHANT SIRTL ETCHANT |
Variable Variable Variable 1 mil/3 min @ 100 °C 25 m/hr @ 100 °C 1 hr @ 75-100 °C 5-10 min @ 118 °C Defect Characterization Defect Characterization Defect Characterization |
PKP-308PI HARE SQ (SU-8) |
Semiconductor
Semiconductor MEMS Semiconductors Solar Cells Semiconductor Testing Semiconductor Testing Semiconductor Testing |
| SiC | SILICON CARBIDE | 80 Å/min | PKP-308PI HARE SQ (SU-8) |
LED |
| SiO2 | BUFFER HF IMPROVED
BD ETCHANT TIMETCH SILOX VAPOX III BUFFERED OXIDE ETCHANTS (BOE) |
800Å/min @ 25 °C Thermally Grown Variable 90 Å/min @ 25 °C 4000 Å/min @ 22 °C 5000 Å/min Variable |
PKP-308PI HARE SQ (SU-8) |
Semiconductor & Integrated Circuits
PSG/BSG CVD CVD, Al Compatible Al Compatible |
| SiO | SILICON MONOXIDE ETCH | 5000 Å/min @ 85 °C | PKP-308PI HARE SQ (SU-8) |
Semiconductor Devices |
| Si3N4 | TRANSETCH N | 125 Å/min @ 180 °C | SiO2 (Silox) | Semiconductor & Integrated Circuits |
| Ag | SILVER ETCHANT TFS | 200 Å/sec @ 25 °C | KLT6000 Series KLT 5300 Series HARE SQ (SU-8) PKP-308PI TRANSIST |
Semiconductor & Thin Film Circuits |
| Stainless Steel | Nickel Etch Type I | 45 Å/sec @ 25 °C, AISI 316 | KLT6000 Series KLT 5300 Series HARE SQ (SU-8) PKP-308PI TRANSIST |
Alloys |
| Ta Ta3N5 Ta2O5 |
SIE-8607 Ta Etch 111 |
70 Å/sec @ 25 °C 30 Å/sec @ 25 °C |
KLT6000 Series KLT 5300 Series HARE SQ (SU-8) PKP-308PI |
Capacitors
Semiconductors |
| TaSi | Tantalum Silicide Etch | 50 Å/sec @ 20 °C | KLT6000 Series KLT 5300 Series HARE SQ (SU-8) PKP-308PI |
Thin Film Electronics |
| Sn, SnO | Tin, Tin Oxide | 15 Å/sec @ 25 °C | KLT6000 Series KLT 5300 Series HARE SQ (SU-8) PKP-308PI TRANSIST |
Microelectronic Circuits |
| Ti | TITANIUM ETCHANTS
TFT TFTN |
25 Å/sec @ 20 °C (TFT) 50 Å/sec @ 30 °C (TFT) 10 Å/sec @ 70 °C (TFTN) 50 Å/sec @ 85 °C (TFTN) |
KLT6000 Series KLT 5300 Series HARE SQ (SU-8) PKP-308PI |
Integrated Circuits
SiO2 Compatible |
| TiN | Titanium Nitride Etch | 30 Å/sec @ 20 °C | KLT6000 Series KLT 5300 Series HARE SQ (SU-8) PKP-308PI |
Microelectronics |
| Ti-W | TI-TUNGSTEN ETCHANT TiW-30 | 20-30 Å/sec | KLT6000 Series KLT 5300 Series HARE SQ (SU-8) PKP-308PI TRANSIST |
Thin Film Circuits Adhesion Layer |
| W | TUNGSTEN ETCH TFW | 60 Å/sec @ 30 °C | PKP-308PI HARE SQ (SU-8) |
Integrated Circuits |
| ELECTRONIC GRADE CHEMICALS (SOLVENTS, ACIDS) |
Customer Tools
Locations
Transene Company’s quality system is ISO 9001:2015 certified.
A copy of our quality policy is available upon request.
Click here for a copy of our ISO certificate