Advanced Materials for Electronics


ZEP 520 A e-Beam Photoresist

Solvent Kleene and Surface Labs are now part of Transene Company!

NOVO Safe Developers SE33-26 and SE44-26 are in concentrations equivalent to 0.26 N TMAH











Transene is now offering alternatives to PFAS surfactants for chrome etching, BOE solutions, aluminum etching, and resist developing.  Contact us for more details.