Transene LM Brand Electronic Chemicals

NOVO-SAFE TMAH
Ammonium Fluoride LM
Ammonium Hydroxide 30% LM
Hexamethyldisilazane (HMDS) LM
Hydrochloric Acid 37% LM
Hydrofluoric Acid 49% LM
Hydrogen Peroxide 30% Stablized LM
Isopropanol 99.8% LM
Methanol 99.9% LM
Nitric Acid 69.5% LM
Phosphoric Acid, 85% LM
Sulfuric Acid 96% LM
Tetramethylammonium Hydroxide (TMAH) 25% LM
Xylenes LM 99.5%

TRANSENE NEW PRODUCTS

Photomask Materials
Etchant-Compatible Positive Photoresist
No Load Mounting Cement
Pure Strip Sulfuric Acid-Peroxide Piranha Type Etch

Microchrome Technology Products Is Now Part of Transene!