NEGATIVE PHOTORESIST CHEMICALS

DESCRIPTION:

Negative photoresist chemicals are available for all phases of photolithographic operation. High purity solvents and solvent blends are filtered to 0.1 µ absolute and are supplied with a certificate of analysis.

  • NPR 4040 – Negative Photoresist Rinse is an effective rinse for unexposed negative photoresist.
  • PKP II Thinner is a thinning solvent for PKP Type II photoresist.
  • PKP II Rinse is specifically formulated for use with PKP Type II photoresist.
  • Stoddard Solvent is specifically formulated for use with PKP Type II photoresist.