Electronic Grade Chemicals
High purity chemicals, low sodium, required for high yield processing of semiconductors.
Ammonium Fluoride 40%
| Assay (NH4F) | 40.0% ± 1% |
| pH | 7.75 ± 0.25 |
| Residue after ignition(max) | 10 PPM |
| Impurity | Max. PPM |
| Chlorides (Cl) | 4.0 |
| Sulfates (as SO4) | 2.0 |
| Heavy Metals (as Pb) | 1.0 |
| Iron (Fe) | 1.0 |
| Phosphorus (as PO4) | 1.0 |
| Sodium (Na) | 1.0 |
| Arsenic (As) | 0.5 |
| Copper (Cu) | 0.5 |
| Nickel (Ni) | 0.5 |
Hydrofluoric Acid 49%
| Assay (HF) | 49% ± 0.25% |
| Sp. GR. @ 60 °F | 1.18 ± 0.005 |
| Residue after ignition(max) | 5 PPM |
| Fluosilicic Acid (H2SiF6) | 100 PPM |
| Impurity | Max. PPM |
| Chlorides (Cl) | 5.0 |
| Sulfates (as SO4) | 2.0 |
| Phosphorus (as PO4) | 1.0 |
| Heavy Metals (as Pb) | 0.5 |
| Iron (Fe) | 0.5 |
| Sodium (Na) | 0.5 |
| Copper (Cu) | 0.1 |
| Lead (Pb) | 0.1 |
| Nickel (Ni) | 0.1 |
| Arsenic (As) | 0.05 |
Nitric Acid 70%
| Assay ( HNO3) | 70% ± 1% |
| Sp. Gr. @ 60 °F | 1.420 ± 0.004 |
| Residue after ignition(max) | 4 PPM |
| Impurity | Max. PPM |
| Chlorides (Cl) | 0.1 |
| Sulfates (as SO4) | 1.0 |
| Heavy Metals (as Pb) | 0.1 |
| Arsenic (As) | 0.005 |
| Iron (Fe) | 0.2 |
| Copper (Cu) | 0.05 |
| Nickel (Ni) | 0.05 |
| Chromium (Cr) | 0.1 |
Acetic Acid Glacial
| Assay (CH3COOH) | 99.7% minimum |
| Residue after evaporation(max) | 10 PPM |
| Impurity | Max. PPM |
| Chlorides (Cl) | 1.0 |
| Sulfates (as SO4) | 1.0 |
| Heavy Metals (as Pb) | 0.5 |
| Iron (Fe) | 0.2 |
| Copper (Cu) | 0.1 |
| Nickel (Ni) | 0.1 |
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