Photoresist Materials
- KLT 6000 Etchant-Compatible Positive Photoresist
- KLT 5300 Etchant-Compatible Positive Photoresist
- HARE-SQ Negative Tone Photoresist (SU-8 Type)
- TRANSIST Positive and Negative Photoresist Chemicals
- PKP-308PI Photoresist
- PKP II has been replaced by PKP-308PI
- HSQ EBL Negatve Resist
Micro Photoresist Ancillary Chemicals
- NPD Negative Resist Developers
- Negative Resist Remover
- Negative Resist Chemicals
- Positive Resist Removers
- Photomask Coating
- Hexamethyldisilazane (HMDS)
- Solvents
- Positive Resist Developers
- Pure Strip Sulfuric Acid-Peroxide Piranha Type Etch
- TMAH Substitutes
- NOVO Developers
- Isopropanol:MIBK 3:1
- DCSP Primers/Adhesion Promoters
- Edge Bead Remover (EBR)
e-Beam Photoresist from ZEON
Macro Photoresist Materials
Macro Photoresist from Alpha Assembly
Developers, Strippers, and Thinners
- KPR Thinner
- KPR Developer
- KPR Dye Blue
- KPR 3/4 Developer
- PKP Thinner replaces KTFR Thinner
- PKP Developer replaces KTFR Developer
- LPR-1 Thinner
- LPR-1 Developer
- Stripper PRS-11
- Strippers KD, KS, No. 400, and 14-HS
- Strippers THP and GCS
- 1 F/A
- CD/3
- CSC
- CST