GALLIUM ARSENIDE ETCHANTS
DESCRIPTION:
Gallium arsenide etchants offer isotropic or anisotropic etching of gallium arsenide and ternary compounds such as gallium indium arsenide and aluminum gallium arsenide. Clean, uniform etching is available in combination with silicon dioxide masks.
Two etching systems are offered. GA Etch 100 is an acidic, isotropic etchant with fast etch rate. GA Etch 300 provides greater versatility, broad photoresist compatibility, and an extended shelf life. All GA Etches require cold storage conditions.
PROPERTIES OF TRANSENE GA ETCH 100
How do I increase the etch rate? | 1. The rate will approximately double with every 10°C increase in temperature. 2. Increase the rate of stirring or agitation. |
How do I reduce the etch rate? | Adding 1 part deionized water to 2 parts etchant will reduce the etch rate approximately 50%. |
Do I need to dilute the etchant? | No, it is ready to use. |
How do I reduce undercutting? | Increase the rate of stirring or agitation. |
Appearance | Clear, colorless |
pH | <2 |
Etch Rate at 25°C | 22 Å/sec. |
Etch Capacity (rate declines at ~70%) | 65 g/gallon |
Shelf Life | 4 months |
Storage Conditions | Ambient, refrigeration preferred |
Filtration | 0.2 um |
Recommended Operating Temperatures | 20-80oC (30-40oC most common) |
Rinse | Deionized water; may be followed by alcohol rinse if desired. |
Photoresist Recommendations | KLT6000 Series, KLT 5300 Series, HARE SQ (SU-8 type), TRANSIST, or PKP-308PI |
Select Compatible Materials | Ni, Au, Si, SiO2, alumina
See https://transene.com/etch-compatibility/ for more details. |
Select Incompatible Materials | Cu, Al |
Compatible Plastics | HDPE, PP, Teflon, PFA, PVC |
Country of Origin | USA |
Availability | 1-2 days |
Available Sizes | Quart, Gallon, 5 Gallon, 55 Gallon |
Packaging | HDPE |
Packing | 4 gallons/case |
Isotropy | Isotropic |
Incompatible Chemicals | Strong bases |
Additional Information | — |
PROPERTIES OF TRANSENE GA ETCH 300
How do I increase the etch rate? | 1. The rate will approximately double with every 10°C increase in temperature. 2. Increase the rate of stirring or agitation. |
How do I reduce the etch rate? | Adding 1 part deionized water to 2 parts etchant will reduce the etch rate approximately 50%. |
Do I need to dilute the etchant? | No, it is ready to use. |
How do I reduce undercutting? | Increase the rate of stirring or agitation. |
Appearance | Clear, colorless |
pH | 6-7 |
Etch Rate at 40°C | 32 Å/sec. |
Etch Capacity (rate declines at ~70%) | 65 g/gallon |
Shelf Life | 6 months |
Storage Conditions | Ambient, refrigeration preferred |
Filtration | 0.2 um |
Recommended Operating Temperatures | 20-80oC (30-40oC most common) |
Rinse | Deionized water; may be followed by alcohol rinse if desired. |
Photoresist Recommendations | KLT6000 Series, KLT 5300 Series, HARE SQ (SU-8 type), TRANSIST, or PKP-308PI |
Select Compatible Materials | Ni, Au, silica, alumina, silicon nitride
See https://transene.com/etch-compatibility/ for more details. |
Select Incompatible Materials | Cu, Al |
Compatible Plastics | HDPE, PP, Teflon, PFA, PVC |
Country of Origin | USA |
Availability | 1-2 days |
Available Sizes | Quart, Gallon, 5 Gallon, 55 Gallon |
Packaging | HDPE |
Packing | 4 gallons/case |
Isotropy | Isotropic |
Incompatible Chemicals | Strong bases |
Additional Information | — |
APPLICATION:
GA Etches may be used in Pyrex, HDPE, Teflon, or other tank materials. Surface smoothness may be controlled by varying the agitation rate. GA Etch 100 is based on sulfuric acid/hydrogen peroxide chemistry. GA Etch 300 utilizes a mildly acidic citric acid-hydrogen peroxide formulation to achieve greater versatility.
Transene’s proprietary stabilizer package allows for consistent etch results over a longer time frame than typically available from peroxide chemistries.
All GA Etches are manufactured using high purity raw materials such as semi or ACS Reagent chemicals and 1018 Mohm.cm resistivity deionized water.