Advanced Materials for Electronics

Microchrome Technology Products

Negative and Reversal Process Chemistries:
Emulsion Negative Process Sheet

Step Time
(In Minutes)
Description
1) Expose photoplate. Determine exposure empirically.
2) 4 D-5 Developer. Develop with gentle agitation at room temp. (70°F +/- 1°F). Develop in tank, or ATP Processing methods.
3) 2 Rinse with filtered DI water using immersion or spray.
4) 2 – 5 F-4 Fixer. fix at room temp. (70°F +/- 1°F). Determine empirically the first fix times.
5) 2 Rinse with filtered DI water using immersion or spray.
6) 2 PCS-605 Cleaning Solution. Clean the plates at room temp. Use cleanroom foam wipes to gently scrub the surface.
7) 4 Rinse vigorously with filtered DI water using immersion or spray.
8) Dry Dry in clean, class 100 or better environment. If rinser/dryer is used, all humidity MUST be exhausted out of the room. If alcohol is used, ascertain that it is extremely clean and contains no contaminates.

Note: Use PCS-605 Photomask Cleaning Solution to reclean masks after handling.
Shorter process times may be used if ATP processing is implemented.

TECHNICAL NOTE:

1. Agitate plate for 5 seconds every 30 seconds for the develop
step. Agitate 5 seconds every minute for the remainder of
the steps.

2. Use fresh chemistry–change as often as required/needed.