Advanced Materials for Electronics

Microchrome Technology Products

Hard Surface Process Chemistry:
Positive Process Sheet

Step Time
(In Seconds)
1) Expose photoplate. Determine exposure empirically.
2) 45 PPD-450 Developer. Develop with gentle agitation at room temp. (70°F +/- 1°F). Develop in tank, spray or tray mode.
3) 60 Rinse with filtered DI water using immersion or spray.
4) 30 – ? CEP-200 Etchant. Etch at room temp. (70°F +/- 1°F). Different manufacturers have different thickness and quality of chrome layers. Determine empirically the first etching times. (Normal etch rate is 33Å chrome/sec). Etch typically to clear time plus 10% over etch.
5) 60 Rinse with filtered DI water using immersion or spray.
6) 5 minutes PRS-100 Stripper. Strip photoresist at room temp. with agitation.
7) 2 minutes Wash in filtered DI water followed with a forceful spray.
8) Dry Spin dry

Determine exposure empirically to visually clear the image in 30-45 seconds. Then over-develop beyond the visually clear time by 15% of develop time. This will cleanup any traces of non-visual photoresist on the plate.

NOTE: Use PCS-605 Photomask Cleaning Solution to reclean masks after handling.