Microchrome Technology Products
Hard Surface Process Chemistry:
Positive Process Sheet
|1)||—||Expose photoplate. Determine exposure empirically.|
|2)||45||PPD-450 Developer. Develop with gentle agitation at room temp. (70°F +/- 1°F). Develop in tank, spray or tray mode.|
|3)||60||Rinse with filtered DI water using immersion or spray.|
|4)||30 – ?||CEP-200 Etchant. Etch at room temp. (70°F +/- 1°F). Different manufacturers have different thickness and quality of chrome layers. Determine empirically the first etching times. (Normal etch rate is 33Å chrome/sec). Etch typically to clear time plus 10% over etch.|
|5)||60||Rinse with filtered DI water using immersion or spray.|
|6)||5 minutes||PRS-100 Stripper. Strip photoresist at room temp. with agitation.|
|7)||2 minutes||Wash in filtered DI water followed with a forceful spray.|
Determine exposure empirically to visually clear the image in 30-45 seconds. Then over-develop beyond the visually clear time by 15% of develop time. This will cleanup any traces of non-visual photoresist on the plate.
NOTE: Use PCS-605 Photomask Cleaning Solution to reclean masks after handling.