Microchrome Technology Products
Hard Surface Process Chemistry:
Positive Process Sheet
| Step | Time (In Seconds) |
Description |
| 1) | — | Expose photoplate. Determine exposure empirically. |
| 2) | 45 | PPD-450 Developer. Develop with gentle agitation at room temp. (70°F +/- 1°F). Develop in tank, spray or tray mode. |
| 3) | 60 | Rinse with filtered DI water using immersion or spray. |
| 4) | 30 – ? | CEP-200 Etchant. Etch at room temp. (70°F +/- 1°F). Different manufacturers have different thickness and quality of chrome layers. Determine empirically the first etching times. (Normal etch rate is 33Å chrome/sec). Etch typically to clear time plus 10% over etch. |
| 5) | 60 | Rinse with filtered DI water using immersion or spray. |
| 6) | 5 minutes | PRS-100 Stripper. Strip photoresist at room temp. with agitation. |
| 7) | 2 minutes | Wash in filtered DI water followed with a forceful spray. |
| 8) | Dry | Spin dry |
Determine exposure empirically to visually clear the image in 30-45 seconds. Then over-develop beyond the visually clear time by 15% of develop time. This will cleanup any traces of non-visual photoresist on the plate.
NOTE: Use PCS-605 Photomask Cleaning Solution to reclean masks after handling.
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