Advanced Materials for Electronics

Ti-Tungsten TiW-30

Ti-Tungsten TiW-30 is a selective etchant for titanium-tungsten adhesion layers in microelectronics applications. TiW-30 effectively etches Ti-tungsten films deposited on silicon nitride, or silicon oxide. TiW-30 provides excellent definition and etch rate control. Broad compatibility with positive and negative photoresists is offered.


Ti-Tungsten TiW-30 etchant is a ready-to-use solution specifically designed to remove titanium-tungsten alloy adhesion layers from substrates such as silicon dioxide and silicon nitride. TiW-30 will not attack aluminum films. Heating the etchant to 40°C will speed the etch rate for thicker films.


How do I increase the etch rate? 1. The rate will approximately double with every 10°C increase in temperature.
2. Increase the rate of stirring or agitation.
How do I reduce the etch rate? Adding 1 part deionized water to 2 parts etchant will reduce the etch rate approximately 50%.
Do I need to dilute the etchant? No, it is ready to use.
How do I reduce undercutting? Increase the rate of stirring or agitation.
Appearance Clear, colorless
pH Mild acid
Etch Rate at 40°C 10-15 Å/sec.
Etch Capacity (rate declines at ~70%) 65 g/gallon
Shelf Life 6 months
Storage Conditions -40 to 0 oC
Filtration 0.2 um
Recommended Operating Temperatures 20-80oC (30-40oC most common)
Rinse Deionized water
Photoresist Recommendations KLT6000 Series, KLT 5300 Series, HARE SQ (SU-8 type), TRANSIST, or PKP-308PI
Select Compatible Materials Au, glass, oxide, nitride, Ni, Cu

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Select Incompatible Materials Ti
Compatible Plastics HDPE, PP, Teflon, PFA, PVC
Country of Origin USA
Availability 1-2 days
Available Sizes Quart, Gallon, 5 Gallon, 55 Gallon
Packaging HDPE
Packing 4 gallons/case
Isotropy Isotropic
Incompatible Chemicals Flammables, combustibles
Additional Information Oxidizer.  Store with vented cap.