Photoresist Materials

Micro Photoresists

• KLT 6000 Etchant-Compatible Positive Photoresist
• KLT 5300 Etchant-Compatible Positive Photoresist
• HARE-SQ Negative Tone Photoresist (SU-8 Type)
• TRANSIST Positive and Negative Photoresist Chemicals
• PKP-308PI Photoresist
• PKP II has been replaced by PKP-308PI
• HSQ EBL Negatve Resist

Micro Photoresist Ancillary Chemicals

• NPD Negative Resist Developers
• Negative Resist Remover
• Negative Resist Chemicals
• Positive Resist Removers
• Photomask Coating
• Hexamethyldisilazane (HMDS)
• Solvents
• Positive Resist Developers
• Pure Strip Sulfuric Acid-Peroxide Piranha Type Etch
• TMAH Substitutes
• NOVO Developers
• Isopropanol:MIBK 3:1
• DCSP Primers/Adhesion Promoters
• Edge Bead Remover (EBR)

e-Beam Photoresist from ZEON

• Zeon ZEP 520A

Also Available:

• ZEP Thinner
• ZEP Developer
• ZEP Stripper
• Sample quantities of ZEP 520A-2 and 520A-7

Macro Photoresist Materials

• KPR and KTFR have been replaced by PKP-308PI
  

Developers, Strippers, and Thinners

• • PKP Thinner replaces KTFR Thinner
  • PKP Developer replaces KTFR Developer
  • Stripper PRS-11
  • Strippers KD, KS, No. 400, and 14-HS

Cleaners

• 1 F/A
• CD/3
• CSC
• CST